OPEN CALL FOR “COUNTERHEGEMONY: ART IN A SOCIAL CONTEXT” ARTIST FELLOWSHIP PROGRAM

DEADLINE for the artist fellowship program "Art in a Social Context" is Sept.17, 2014

Late Deadline: September 20th (It is preferred applications are sent in by September 17th, but we will consider late applications until September 20th).

Unfortunately due to the high number of applicants, we are only able to contact those we are interested in interviewing. Everybody we are interested in interviewing will be contacted by September 30.

"Counterhegemony: Art in a Social Context" is a 7 week Artist Fellowship Program at NIDA Art Colony that looks at genealogy, or the epistemic context within which bodies of knowledge become intelligible and authoritative, as a point of departure in art production. It is aimed at any art or cultural production that exists within or in reference to social forms of resistance that coalesce in opposition to hegemonic structures.

 

It is comprised of three modules:

(1) A Geneaology of the Participant
(2) Law as Raw Material
(3) Foucault Lab (read more)

There are two components to the program: one is the artist's individual studio practice. The second is a think tank consisting of readings, discussions, performances, and text jams related to the three discursive modules, culminating in a group exhibition at the Contemporary Art Centre in Vilnius, as well as a public presentation at the CAC Reading Room. Each Fellow will receive a 600 euro stipend, free housing, and travel expenses to and from NIDA Art Colony.

"Counterhegemony: Art in a Social Context" will take place from November 1–December 19, 2014 in Nida Art Colony of Vilnius Academy of Arts and is curated by Andrea Liu.

Guest Speakers Include:

Chto Delat (Russian art collective)

Jonas Staal (Dutch visual artist, founder of New World Summit)

Milo Rau (Swiss theater artist, founder of International Institute of Political Murder)

Julian Stallabrass (British art critic, Art History Professor at Courtauld Institute of Art, London)

FOR MORE INFORMATION ON HOW TO APPLY, SEE HERE.